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Characteristic of Molecule Ion Implanted Epitaxial Wafers for CMOS image sensor (Ⅰ) -Reaction kinetic analysis of hydrogen diffusion behavior-
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- Okuyama Ryosuke
- SUMCO
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- Masada Ayumi
- SUMCO
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- Suzuki Akihiro
- SUMCO
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- Kobayashi Koji
- SUMCO
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- Shigematsu Satoshi
- SUMCO
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- Hirose Ryo
- SUMCO
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- Kadono Takeshi
- SUMCO
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- Koga Yoshihiro
- SUMCO
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- Kurita Kazunari
- SUMCO
Bibliographic Information
- Other Title
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- CMOSイメージセンサ向け分子イオン注入エピタキシャルウェーハの製品特性（Ⅰ） -水素脱離挙動の反応速度論解析-
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2019.1 (0), 3322-3322, 2019-02-25
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390856152139589632
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC