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Characteristic of Molecular Ion Implanted Epitaxial Wafers (4) -A Study of Recrystallization of Implantation-related Defect Using Flash Lamp Annealing-
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- kobayashi kouji
- SUMCO CORPORATION
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- Masada Ayumi
- SUMCO CORPORATION
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- Okuyama Ryosuke
- SUMCO CORPORATION
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- Shigematsu Satoshi
- SUMCO CORPORATION
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- Hirose Ryo
- SUMCO CORPORATION
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- Koga Yoshihiro
- SUMCO CORPORATION
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- Okuda Hidehiko
- SUMCO CORPORATION
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- Kurita Kazunari
- SUMCO CORPORATION
Bibliographic Information
- Other Title
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- 分子イオン注入エピウェーハの製品特性（４）-フラッシュランプ熱処理による注入欠陥の結晶性回復挙動解析-
- Published
- 2018-03-05
- DOI
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- 10.11470/jsapmeeting.2018.1.0_3742
- Publisher
- The Japan Society of Applied Physics
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2018.1 (0), 3742-3742, 2018-03-05
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390856605462824448
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC
