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Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (5) -Carbon cluster ion implantation-related defect formation analyzed by X-ray photoelectron spectroscopy-
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- Masada Ayumi
- SUMCO
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- Hirose Ryo
- SUMCO
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- Shigematsu Satoshi
- SUMCO
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- Koga Yoshihiro
- SUMCO
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- Okuda Hidehiko
- SUMCO
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- Kurita Kazunari
- SUMCO
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- KADONO TAKESHI
- SUMCO
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- Okuyama Ryosuke
- SUMCO
Bibliographic Information
- Other Title
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- 炭素クラスターイオン注入Siエピウェーハの特徴(5) －X線光電子分光法による注入欠陥形成の解析－
- Published
- 2017-03-01
- DOI
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- 10.11470/jsapmeeting.2017.1.0_3613
- Publisher
- The Japan Society of Applied Physics
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2017.1 (0), 3613-3613, 2017-03-01
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390857136568671104
-
- ISSN
- 24367613
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- Text Lang
- ja
-
- Data Source
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- JaLC
