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Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (5) - Impact of Carbon Cluster Ion Implanted Projected Range using by Microwave heat treatment -
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- KADONO TAKESHI
- SUMCO CORPORATION
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- OKUYAMA RYOSUKE
- SUMCO CORPORATION
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- MASADA AYUMI
- SUMCO CORPORATION
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- HIROSE RYOU
- SUMCO CORPORATION
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- KOGA YOSHIHIRO
- SUMCO CORPORATION
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- OKUDA HIDEHIKO
- SUMCO CORPORATION
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- KURITA KAZUNARI
- SUMCO CORPORATION
Bibliographic Information
- Other Title
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- 炭素クラスターイオン注入Siエピウェーハの特徴（5） -マイクロ波加熱処理がクラスター注入レンジに与える効果-
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2016.1 (0), 3623-3623, 2016-03-03
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390858397088711424
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC