Product Design of Silicon Wafers for 3D Stacked CMOS Image Sensor (II) – Photoemission Spectroscopy Study on Variation in SiO<sub>2</sub>/Si Interfacial Strain with Annihilation of Interface State Defects –

Bibliographic Information

Other Title
  • 3次元積層型CMOSイメージセンサ向けSiウェーハの製品設計(Ⅱ) –SiO<sub>2</sub>/Si界面準位欠陥の消滅に伴う歪み状態変化の光電子分光分析–
Published
2022-02-25
DOI
  • 10.11470/jsapmeeting.2022.1.0_2806
Publisher
The Japan Society of Applied Physics

Journal

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