Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Daniele Leonelli and Anne Vandooren and Rita Rooyackers,Silicide engineering to boost Si tunnel transistor drive current,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-04,50,4,,https://cir.nii.ac.jp/crid/1520009407907285632,