著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Xu Li and Haiping Zhou and Chris D. W. Wilkinson,Optical Emission Spectrometry of Plasma in Low-Damage Sub-100nm Tungsten Gate Reactive Ion Etching Process for Compound Semiconductor Transistors,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2006-10,45,10B,8364-8369,https://cir.nii.ac.jp/crid/1520009408036392448,https://doi.org/10.1143/jjap.45.8364