Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Alessandro Vaglio Pret and Roel Gronheid and Jan Engelen,Mask Effects on Resist Variability in Extreme Ultraviolet Lithography,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2013-06,52,6,,https://cir.nii.ac.jp/crid/1520009408697155584,