著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI) Rihito Kuroda and Akinobu Teramoto and Shigetoshi Sugawa,Impact of channel direction dependent low field hole mobility on (100) orientation silicon surface,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-04,50,4,,https://cir.nii.ac.jp/crid/1520009408789878272,