著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Anabela Veloso and An De Keersgieter and Stephan Brus,Multi-gate fin field-effect transistors junctions optimization by conventional ion implantation for (sub-)22nm technology nodes circuit applications,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-04,50,4,,https://cir.nii.ac.jp/crid/1520009409068696064,