著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hirofumi SHIMIZU and Yuji SANADA,Enhancement and Retardation Mechanism of Ultra-Thin SiO₂ Growth on Thermally Oxidized Cr-Contaminated n-Type Si(001) Surfaces,"日本大学工学部紀要 = The Journal of the College of Engineering, Nihon University",13432885,郡山 : 日本大学工学部工学研究所,2013-03,54,2,25-33,https://cir.nii.ac.jp/crid/1520009409477010176,