Enhancement and Retardation Mechanism of Ultra-Thin SiO₂ Growth on Thermally Oxidized Cr-Contaminated n-Type Si(001) Surfaces

Details 詳細情報について

• CRID

  1520009409477010176

• NII Article ID

  40019654685

• NII Book ID

  AA11163716

• ISSN

  13432885

• NDL BIB ID

  024528056

• Web Site

  http://id.ndl.go.jp/bib/024528056

  https://ndlsearch.ndl.go.jp/books/R000000004-I024528056

• Text Lang

  en

• NDL Source Classification

  • ZM2(科学技術--科学技術一般--大学・研究所・学会紀要)

• Data Source

  • NDL
  • CiNii Articles