著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hyun-Woo Kim and Sang-Jun Choi and Dong-Won Jung,A Novel Platform for Production-worth ArF Resist,Journal of photopolymer science and technology,09149244,Chiba : The Society of Photopolymer Science and Technology,2001,14,3,363-371,https://cir.nii.ac.jp/crid/1520010379792425984,