著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yasuhiro Abe and Noriyuki Miyata and Hiroshi Nohira,Reduction of accumulation capacitance in direct-contact HfO2/p-type Si metal-oxide-semiconductor capacitors,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2010-06,49,6,,https://cir.nii.ac.jp/crid/1520290882142385920,