Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
関根 誠 and 堀 勝,5. Dry Etching Technology of Low Dielectric Constant (Low-k) Materials(<Special Topic Article>New Emerging Aspects of Science and Technology in Dry Etching),プラズマ・核融合学会誌 = Journal of plasma and fusion research,09187928,名古屋 : プラズマ・核融合学会編集委員会,2009-04,85,4,193-198,https://cir.nii.ac.jp/crid/1520290882175873024,