著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yong-Hae Kim and Sung-Keun Chang and Seon-Soon Kim,Characteristics of Dual Polymetal(W/WNx/Poly-Si)Gate Complementary Metal Oxide Semiconductor for 0.1μm Dynamic Random Access Memory Technology,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2000-04,39,4B,1969-1973,https://cir.nii.ac.jp/crid/1520290882284151040,