著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hirofumi SHIMIZU and Toshikazu NISHIDE,"Summary of Characterizations of Sol-Gel-Derived Crystalline HfO₂, ZrO₂, ZrO₂-Y₂O₃ Thin Films on Si(001) Wafers with High Dielectric Constant","日本大学工学部紀要 = The Journal of the College of Engineering, Nihon University",13432885,郡山 : 日本大学工学部工学研究所,2016-03,57,2,7-28,https://cir.nii.ac.jp/crid/1520290882966134400,