著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Craig D. Higgins and Charles R. Szmanda and Alin Antohe,"Resolution, line-edge roughness, sensitivity tradeoff, and quantum yield of high photo acid generator resists for extreme ultraviolet lithography",Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-03,50,3,036504,https://cir.nii.ac.jp/crid/1520290883298492928,https://doi.org/10.7567/jjap.50.036504