Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Yoshiharu Enta and Kano Ogawa and Takayuki Nagai,Void and Nanostructure Formations during Thermal Decomposition of 20-nm-Thick Silicon Oxide Layer on Si(100),Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2013-03,52,3,,https://cir.nii.ac.jp/crid/1520290883587482880,