著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Chang Heon Yi and Tae Whan Kim and Keun-Ho Kim,Atmospheric pressure plasma ashing for display manufacturing,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2008-08,47,8,6965-6969,https://cir.nii.ac.jp/crid/1520290883759031936,https://doi.org/10.1143/jjap.47.6965