Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Rengie Mark D. MAILIG and Min Gee KIM and Shun-ichiro OHMI,Schottky Barrier Height Reduction of Pd₂Si/Si(100) Diodes by Dopant Segregation Process,電子情報通信学会技術研究報告 = IEICE technical report : 信学技報,09135685,東京 : 電子情報通信学会,2018-10,118,241,35-40,https://cir.nii.ac.jp/crid/1520290883816216960,