著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Harry Sewell and Alek Chen and Jo Finders,Progress in extending immersion lithography for the 32nm node and beyond,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2009-06,48,6,06FA01,https://cir.nii.ac.jp/crid/1520290883852553216,https://doi.org/10.1143/jjap.48.06fa01