Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Yoshiyuki Utsumi and Takehiro Seshimo and Yoshitaka Komuro,Studies of the photo acid generator material design for chemically amplified photoresists,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2009-06,48,6,,https://cir.nii.ac.jp/crid/1520290884302870912,