著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Jong Duk Lee and Tae Hwan An and Hak Gi Noh,Growth kinetics and properties of thin cobalt films electrodeposited on n-Si(100),Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2010-08,49,8,085802,https://cir.nii.ac.jp/crid/1520290884407914624,https://doi.org/10.1143/jjap.49.085802