著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Keisuke Yamaoka and Naomichi Okada and Yuji Yoshizako,Effect of plasma gases on insulating properties of low-temperature-deposited SiOCH films prepared by remote plasma-enhanced chemical vapor deposition,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2007-04,46,4B,1997-2000,https://cir.nii.ac.jp/crid/1520572357058749568,https://doi.org/10.1143/jjap.46.1997