著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Teruaki Okino and Yukio Kuba and Masahiro Shibata,130 kV High-Resolution Electron Beam Lithography System for Sub-10-nm Nanofabrication,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2013-06,52,6,,https://cir.nii.ac.jp/crid/1520572357130722688,