著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Muhammad Muhibbullah and Masaya Ichimura,Fabrication of photoconductive copper oxide thin films by the chemical bath deposition technique,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2010-08,49,8,081102,https://cir.nii.ac.jp/crid/1520572357878015488,https://doi.org/10.1143/jjap.49.081102