著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Toru Takeda and Kouji Tanaka and Hirotada Inoue,Microcrystalline/amorphous thin Si films deposition by a newly developed dual injection system employing hydrogen plasma and silicon radicals at low temperature (300℃) chemical vapor deposition process,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2007-04,46,4B,2542-2553,https://cir.nii.ac.jp/crid/1520572358058337792,https://doi.org/10.1143/jjap.46.2542