著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hirotada Inoue and Kouji Tanaka and Yuichi Sano,High-rate deposition of amorphous silicon films by microwave-excited high-density plasma,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-03,50,3,036502,https://cir.nii.ac.jp/crid/1520572358380336896,https://doi.org/10.7567/jjap.50.036502