著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yiming Li and Hui-Wen Cheng,Nanosized-metal-grain-induced characteristic fluctuation in 16nm complementary metal-oxide-semiconductor devices and digital circuits,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-04,50,4,,https://cir.nii.ac.jp/crid/1520572358847649408,