著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Seiichiro Higashi and Shohei Hayashi and Yasuo Hiroshige,Application of thermal plasma jet irradiation to crystallization and gate insulator improvement for high-performance thin-film transistor fabrication,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-03,50,3,,https://cir.nii.ac.jp/crid/1520572358900617472,