著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hirofumi Shimizu and Ryuhei Shin and Masanori Ikeda,Quantitative Estimation of the Metal-Induced Negative Oxide Charge Density in n-Type Silicon Wafers from Measurements of Frequency-Dependent AC Surface Photovoltage,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2006-03,45,3A,1471-1476,https://cir.nii.ac.jp/crid/1520572359029469696,https://doi.org/10.1143/jjap.45.1471