著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Katsunori Makihara and Jin Gao and Kouhei Sakaike,Highly-Crystallized Ge:H Film Growth from GeH₄ Very High Frequency Inductively-Coupled Plasma : Crystalline Nucleation Initiated by Ni Nanodots,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2013-11,52,11,,https://cir.nii.ac.jp/crid/1520572359292380544,