著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yuichi Naitou and Atsushi Ando and Hisato Ogiso,Correlation between surface topography and static capacitance image of iltrathin SiO2 films evaluated by scanning capacitance microscopy,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2007-09,46,9A,5992-5999,https://cir.nii.ac.jp/crid/1520572359307100288,https://doi.org/10.1143/jjap.46.5992