著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yuchan Liu and Jang-Hsing Hsieh and Siew Kong Tung,Determination of SiO2 thickness at the interface of ZnO/Si by ellipsometry,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2007-09,46,9A,6068-6070,https://cir.nii.ac.jp/crid/1520853832018756608,https://doi.org/10.1143/jjap.46.6068