Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Taizoh Sadoh and Hisashi Takeuchi and Koji Ueda,Epitaxial Growth of Ferromagnetic Silicide Fe3Si on Si(111) Substrate,"Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP",00214922,Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics,2006-04,45,4B,3598-3600,https://cir.nii.ac.jp/crid/1520853832034907776,https://doi.org/10.1143/jjap.45.3598