著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Ho Young Jung and Hag Joo Lee and Bong Soo Kwon,Effect of O2 gas during inductively coupled O2/Cl2 plasma etching of Mo and HfO2 for gate stack patterning,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2008-08,47,8,6938-6942,https://cir.nii.ac.jp/crid/1520853832484940032,https://doi.org/10.1143/jjap.47.6938