Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Shuntaro Fujii and Shin-Ichiro Kuroki and Koji Kotani,Strain-induced back channel electron mobility enhancement in polycrystalline silicon thin-film transistors fabricated by continuous-wave laser lateral crystallization,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-04,50,4,,https://cir.nii.ac.jp/crid/1520853832647374336,