著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Han-Wen Liu and Si-Ming Chiou and Hui-Ching Huang,Superior reliability of gate-all-around polycrystalline silicon thin-film transistors with vacuum cavities next to gate oxide edges,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-01,50,1,014202,https://cir.nii.ac.jp/crid/1520853832854848384,https://doi.org/10.7567/jjap.50.014202