Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Jae Hyun Park and Jae Young Song and Jong Pil Kim,Fabrication of highly scaled silicon nanowire gate-all-around metal-oxide-semiconductor field effect transistors by using self-aligned local-channel V-gate by optical lithography process,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2010-08,49,8,,https://cir.nii.ac.jp/crid/1520853832872434816,