Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Akihiro Matsutani and Kousuke Tahara and Takayuki Iwasaki,Fluorination of Graphene by Reactive Ion Etching System Using Ar/F₂ Plasma,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2013-06,52,6,,https://cir.nii.ac.jp/crid/1520853833020684160,