著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Sang-Yong Kim and Jin-Goo Park,Effect of rinse process on removal of crown type defects during photoresist development,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2011-01,50,1,016505,https://cir.nii.ac.jp/crid/1520853833754901760,https://doi.org/10.7567/jjap.50.016505