Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
河合 晃 and 阿部 貴人,Analysis of Pattern Collapse of Electron Beam Resist Ranging from 60 to 152 nm Width with Atomic Force Microscope Tip,日本接着学会誌 = Journal of the Adhesion Society of Japan : adhesion,09164812,大阪 : 日本接着学会,2002,38,1,16-19,https://cir.nii.ac.jp/crid/1520853833829166848,