Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Akihiro Ikeda and Kouhei Kajiwara and Naoya Watanabe,Effect of argon/hydrogen plasma cleaning on electroless Ni deposition on small-area Al pads,Japanese journal of applied physics : JJAP,00214922,Tokyo : The Japan Society of Applied Physics,2010-08,49,8,,https://cir.nii.ac.jp/crid/1520853833980890496,