著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Jiejun Wu and Kazuteru Okuura and Hideto Miyake,Effects of substrate plane on the growth of high quality AlN by hydride vapor phase epitaxy,Applied physics express : APEX,18820778,Tokyo : Japan Society of Applied Physics,2009-11,2,11,111004,https://cir.nii.ac.jp/crid/1520854805104900352,https://doi.org/10.1143/apex.2.111004