Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Shigemasa Ohta and Heishichiro Takahashi,Nanoscale analysis of electron irradiation-enhanced diffusion process on the multilayer interfaces of W-Al2O3-Ti/Cu,Journal of electron microscopy,00220744,Oxford : Published for the Japanese Society of Electron Microscopy by Oxford University Press,1999,48,6,899-903,https://cir.nii.ac.jp/crid/1520854805369758848,