著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Takumi Ueno,"The Photopolymer Science and Technology Award--Francis M.Houlihan,et al.""A Commerially Viable 193 nm Single Layer Resist Platform""",Journal of photopolymer science and technology,09149244,Chiba : The Society of Photopolymer Science and Technology,1998,11,1,5-8,https://cir.nii.ac.jp/crid/1521136280404594816,