著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Toshiyuki Tabata and Kosuke Nagashio and Akira Toriumi,Effect of High-Pressure Inert Gas Annealing on AlON/Ge Gate Stacks,Applied physics express : APEX,18820778,Tokyo : Japan Society of Applied Physics,2012-09,5,9,,https://cir.nii.ac.jp/crid/1521136280996486016,