著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Alastair David Trigg and Li Hong Yu and Cheng Kuo Cheng,Three dimensional stress mapping of silicon surrounded by copper filled through silicon vias using polychromator-based multi-wavelength micro Raman spectroscopy,Applied physics express : APEX,18820778,Tokyo : Japan Society of Applied Physics,2010-08,3,8,,https://cir.nii.ac.jp/crid/1521699228454564992,