著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Robert D. Allen,Trends in patterning materials for advanced lithography,Journal of photopolymer science and technology,09149244,Chiba : The Society of Photopolymer Science and Technology,2007,20,3,453-455,https://cir.nii.ac.jp/crid/1521699229935278080,